FEI introduced three new systems that tailor the power oftransmission electron microscopy (TEM) to specific application and industryneeds. The new systems provide efficient and effective application-specificworkflows for semiconductor manufacturing and scientific research. They includethe new Metrios TEM for advanced semiconductor manufacturing metrology, TalosTEM that provides high-speed imaging and analysis for materials and life-scienceapplications and the Titan Themis TEM for enhanced atomic-scale measurements ofmaterial properties.